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Technical Documentation
Technical Documentation
| Category | Grade | Specific product | Application |
| Zirconium Zr | HZr-1 | Industrial-grade sponge zirconium | Magnetic materials, chromium–zirconium copper, zirconium–magnesium alloy, silicon–zirconium–iron, aluminum–zirconium, and various zirconium-based intermediate alloys as additives; deoxidation and refining in the steel industry. |
| R60702 | Zirconium ingots, zirconium plates, zirconium targets, zirconium wires, zirconium granules, zirconium rods, zirconium tubes, zirconium coiled tubing, zirconium foils, zirconium coils, zirconium flanges, zirconium bolts and nuts, zirconium elbows, zirconium tees, zirconium coil tubing, and other zirconium equipment and components. | Primarily used in the chemical industry, the target material is also suitable for the coating industry. | |
| R60705 | Zirconium ingots, zirconium plates, zirconium wires, zirconium rods, zirconium coiled tubes, zirconium foils, zirconium coils, zirconium flanges, zirconium bolts and nuts, zirconium elbows, zirconium tees, and other zirconium fittings. | Primarily used in the chemical industry. | |
| Zr+Hf≥99.99%, Hf≤3% | Crystalline zirconium, high-purity zirconium ingot | Zirconium-based amorphous alloy, platinum–rhodium alloy | |
| Zr+Hf≥99.99%, Hf≤0.01% | Crystalline zirconium, high-purity zirconium ingots, high-purity zirconium plates, high-purity zirconium targets, high-purity zirconium rods, high-purity zirconium wires, high-purity zirconium granules | Zirconium-based amorphous, optical coating | |
| Hafnium Hf | HHf-01 | Atomic-level sponge hafnium | Supplementing high-temperature alloys |
| JTH1, Hf+Zr ≥ 99.99%, Zr ≤ 0.2% | Crystalline hafnium | Raw materials for hafnium product manufacturing, the aerospace sector, and the cemented carbide industry. | |
| JTH2, Hf+Zr ≥ 99.99%, 0.2 < Zr ≤ 0.5% | |||
| JTH3, Hf+Zr≥99.99%, 0.5＜Zr≤1.0% | |||
| Hf+Zr≥99.99%, Zr≤0.2% | Hafnium ingots, hafnium plates, hafnium targets, hafnium rods, hafnium wires, hafnium granules | Plasma cutting, optical coating, semiconductor coating | |
| Hf+Zr≥99.99%, 0.2＜Zr≤0.5% | |||
| Hf+Zr≥99.99%, 0.5＜Zr≤1.0% |
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