Hafnium Sputtering Target

　　Hafnium target

　　Purity: Hf+Zr ≥ 99.99%, Zr ≤ 0.2%/0.5%/1.0%/2.0%

　　Form: square targets and round targets; can be custom‑made in various sizes according to customer requirements.

　　Applications: optical coatings, semiconductor coatings, and more.

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Hafnium material

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